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193nm double exposure immersion scanners – as an alternative to EUV

Despite its success in EUV lithography, ASML decided not to exclude equipment using 193nm light sources from future development plans – the company included 193nm double exposure immersion scanners. Moreover, the source reports that ASML calls such tools the only lithographic solution that will be available for mass production by 2021-2021.

During the annual Bacus Symposium, the company will talk about double exposure technologies to extend the life cycle of 193nm lithography beyond the 45nm threshold. According to experts, the limiting factor for immersion lithography using light sources with a wavelength of 193 nm is the refractive index of water of 1.44. Accordingly, the minimum achievable standards for such devices are estimated at 45 nm. However, ASML believes that 193nm immersion tools can be used to manufacture logic ICs in compliance with 32nm standards and for memory chips – 40nm process technology.

Hard ultraviolet (EUV) is supposed to be used only for the 32nm technological process and everything that will happen after. Given that 32 nm standards will begin to be introduced around 2021-2021, for which, according to a source with reference to ASML, double exposure immersion scanners will be the “only solution”, it can be expected that this particular technology will have to compete with EUV -lithography. By the way, their cost will be comparable to the cost of EUV solutions – a 193-nm lithographic instrument with a double exposure will cost 30-40 million. dollars, while EUV – 40-50 million. dollars.

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